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  •    Professor
  • Polymer Chemistry (1992 - 2017)
  • Ph.D. 1985, Case Western Reserve University
  • WEBPAGE : http://
  • E-MAIL : kjb@kaist.ac.kr
  • Tel/Office : 042-350-2837 (Office), (Lab) / (Room)


B.S Seoul National University (1975)
M.S KAIST (1977)
Ph.D. Case Western Reserve University (1985)


1992presentProfessor at KAIST
19881992Senior Researcher, LG Chem
19851988:Postdoctoral Fellow. IBM & University of Columbia
19811985:Postdoctoral Fellow. Case Western Reserve University

Academes and Society

present : Member of the Korean Chemical Society,
present : Member of the American Chemical Society
present : Member of the Polymer Society of Korea
2006.012007.12 : The President of Chungcheong Polymer Society of Korea
2008.01present : The councilor of Chungcheong Polymer Society of Korea

Brief Introduction

Research topics

Photosensitive Polymers
Block copolymers
Polymers for display devices

Representative publications

Room Temperature Processable Silicon-Containing Molecular Resist, Ji Young Park, Myung Gi Kim, Jin-Baek Kim, Macromol. Rapid Commun. 2008, 29, 18, 1532.

Novel Top-Surface Imaging Process by Selective Chemisorption of Poly(dimethyl siloxane) on Diazoketo-Functionalized Single Component Photoresist, Ramakrishnan Ganesan, Seul-Ki Youn, Jin-Baek Kim, Macromol. Rapid Commun. 2008, 29, 5, 437.

Photo-patternable electroluminescent blends of polyfluorene derivatives and charge-transporting molecules, Ji Young Park, Jonghee Lee and Jin-Baek Kim, European Polymer Journal 2008, 44, 12, 3981.

Simple micropatterning of biomolecules on a diazoketo-functionalized photoresist, Ramakrishnan Ganesan, So Young Yoo, Jae-Hak Choi, Sang Yup Lee and Jin-Baek Kim, Journal of Material Chemistry 2008,, 18, 703.

Silicon-containing Bilayer Resist Based on a Single Component Nonchemically Amplified Resist System, Ji Young Park and Jin-Baek Kim, Chemistry Letters 2008, 37, 9, 920.

Room Temperature Processable Organic-Inorganic Hybrid Photolithographic Materials Based on a Methoxysilane Cross-Linker, Ji Young Park and Jin-Baek Kim, Polymer Journal 2008, 40, 7, 663.

Photobleachable silicon-containing molecular resist for deep UV lithography Jin-Baek Kim*, Ramakrishnan Ganesan, Jae-Hak Choi, Hyo-Jin Yun, Young-Gil Kwon, Kyoung-Seon Kim and Tae-Hwan Oh, Journal of Material Chemistry 2006, 16, 3448.